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SMART InspEction system for High Speed and multifunctional testing of MEMS and MOEMS

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Fraunhofer IOF

The Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. (FhG) is a link between science and industry, that is between the research and the application of its results. The Fraunhofer IOF is one of 58 non-independent research institutes belonging to the Fraunhofer-Gesellschaft. Research and development at Fraunhofer IOF focuses on optical systems technology with a view to continually improving the control of light from generation via guiding and manipulation up to its application.

The Fraunhofer Institute for Applied Optics and Precision Engineering (IOF) is located in Jena, Germany. It's main areas of research are dedicated to the development of leading edge optical solutions for a broad bandwidth of different application fields.

The microoptics group of IOF has more than 15 years experience in design and fabrication of microoptical and integrated optical elements up to the module level. In particular, polymer waveguides in 2.5 D and 3 D integration as well as microlenses (in wafer scale) were designed, fabricated and characterized. Within former projects competencies have been built up concerning the fabrication of all kinds of micro-optical elements starting from gratings, micro-lenses, lens arrays, single- and multimode waveguides, diffractive optical elements etc. Key technologies available at the IOF are electron-beam, laser- and photo-lithography as well as different reactive ion etching processes. The technological equipment for replication tool original fabrication and UV reaction moulding is available (PE-CVD, RIE and RIBE, mask-aligner spin-coating in clean room) as well as the design tools (FEM, BPM) and measurement set-up’s for the characterization of optical properties of (micro-) optical elements and materials.

The relevant skills of the Fraunhofer IOF within Smartiehs are:

  • micro-optics design

  • micro- and nano-optics fabrication including electron-beam- and laser-lithography, reactive ion etching technologies, UV-replication etc.

  • characterization techniques for micro-optical elements (optical, SEM, AFM, etc.

  • experience in optical systems integration on wafer level

  • participation in different EU projects, e.g. WALORI – Wafer level optics solution for compact CMOS imager

Within the project the Fraunhofer IOF will be responsible for the micro-fabrication technology and the realization of the probing wafers containing the different interferometer arrays.


The web-pages of the IOF can be accessed via

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