K. Gastinger, K. H. Haugholt, M. Kujawinska, M. Jozwik, Technology (Poland); C. Schaeffel, S. Beer,
"Optical, mechanical, and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS," in Optical Measurement Systems for Industrial Inspection VI, edited by Peter H. Lehmann, Proceedings of SPIE Vol. 7389 (in press), 73891J
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems (MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.
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